A Random Walk Approach for Light Scattering in Material
Klaus Simon, Beat Trachsler
Abstract
Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka and Munk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.
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